Share and share alike! Our mothers always said it was the right thing to do, and it seems that this ideology is now coming front and center for double patterning at 20nm and below. As we continue to ...
As the unstoppable progression of Moore’s law has driven the semiconductor technology roadmap farther and farther below 1 µm, a steady stream of engineering marvels has been required to produce ...
Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...
MONTEREY, Calif. — ASML Holding NV has quietly inserted 193-nm immersion with double-patterning techniques on its roadmap, claiming that the technology is the “only” lithographic solution for the ...
If a lot of the buzz at SPIE last week came from the packed sessions on EUV technology, a lot of the serious note-taking was done at the papers on double-patterning. Not least among the sources of ...
Scanner resolution improvements have diminished since the 193-nm wavelength became commonplace. Today’s technologies are sufficient for 28-nm IC designs using immersion, but not beyond without ...
BELMONT, Calif.--(BUSINESS WIRE)--Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the ...
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