Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.
When looking for the best, it is often useful to examine the new or unusual to see if it will change the way designers create new applications. Pattern recognition is a common requirement for many ...
Unlock the full InfoQ experience by logging in! Stay updated with your favorite authors and topics, engage with content, and download exclusive resources. Vivek Yadav, an engineering manager from ...
As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...
This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...
Unlock the full InfoQ experience by logging in! Stay updated with your favorite authors and topics, engage with content, and download exclusive resources. Vivek Yadav, an engineering manager from ...
Experienced Java developers are committed to continuous improvement. We always seek ways to make our code more readable, reliable and efficient. Java's evolution provides a steady stream of powerful ...
Results that may be inaccessible to you are currently showing.
Hide inaccessible results
Feedback