Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

This article looks at some of the abstractions in a new profile of UML, the RT-Profile, which particularly affects software design for real-time use. Included in the paper are a set of patterns that ...

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...